Entegris SPIE 2026 – Filtration, Purification & EUV Pod Solutions

Discover Next-Generation EUV Filtration, Purification, and Pod Solutions

Filterfine Vietnam is pleased to share updates from Entegris, our strategic technology partner, at SPIE Advanced Lithography and Patterning 2026.

At this global semiconductor event, Entegris will showcase its latest innovations in:

✅ Filtration – Ultra-high purity filtration for advanced semiconductor processes
✅ Purification – Chemical purification technologies for defect reduction
✅ Pod Design – Advanced EUV pod solutions for contamination control

These solutions directly address defectivity reduction, yield improvement, and enable next-generation EUV manufacturing.

📍 Conference Session

🗓 February 25 | ⏰ 10:30 AM
📌 Grand Ballroom 220A

Particle Quantification on EUV Inner Pods Using Adhesive and Light-Scattering Tools

This session focuses on quantifying particles inside EUV pods using adhesive sampling and light-scattering technologies—providing accurate insight into particle generation sources within ultra-clean environments.

📍 Poster Sessions

🗓 February 25 | ⏰ 5:30 PM – 7:00 PM
📌 Convention Center – Hall B

Entegris will present multiple application-driven studies, including:

🔹 A Novel Purifier for Acid-Sensitive Applications

Suppressing solvent dimerization and trace metal contamination in acid-sensitive processes.

🔹 Photoresist Filtration Design Advancement

Next-generation UPE filtration technology to improve throughput and reduce photoresist defects.

🔹 Ultra-Clean Nylon Filtration for EUV Underlayer Defect Mitigation

Supporting N2 node performance and yield with ultra-clean nylon filtration.

🔹 Point-of-Use Membrane Filter Optimization for EUV CAR

Reducing bridging defects in chemically amplified resist (CAR) processes for high-NA lithography.

🔹 EUV Dual Pod EIP Polymer Separation

Introducing the NX Pod with polymer pads to eliminate metal-to-metal contact and significantly reduce particle generation.

Core Value Entegris Brings to Advanced Semiconductor Manufacturing

✔ Reduced particle generation
✔ Improved trace metal control
✔ Lower defect density
✔ Increased EUV production yield
✔ Support for advanced nodes (N2, High-NA EUV)

🔗 Register for SPIE Advanced Lithography and Patterning 2026

👉 https://entegris.info/3NMIAbU

Filterfine Vietnam – Authorized Entegris Distributor in Vietnam

Filterfine Vietnam provides comprehensive Entegris solutions for semiconductor fabs, including:

✅ Filtration & purification for chemicals, photoresist, and slurry
✅ EUV pod and contamination control solutions
✅ EUV application consulting
✅ Technical support, validation, and on-site implementation

📩 Contact Filterfine Vietnam to receive detailed technical documentation or discuss tailored Entegris solutions for your fab.