When “Cleanliness” Is No Longer Just About Water Filtration

In today’s advanced electronics and semiconductor industries, Ultra Pure Water (UPW) systems are no longer considered merely supporting utilities. They have become a critical part of the manufacturing process itself.

Processes such as:

• Ultrasonic cleaning and air washer cleaning
• Post-plating rinsing after nickel, copper, or gold electroplating
• Ultra pure water (UPW) treatment systems
• Wastewater treatment systems for oxide dyes or cyanide-containing streams

all require water purity levels that are extremely close to absolute.

As semiconductor technologies continue moving toward smaller nanometer-scale processes, sensitivity to contamination increases exponentially. Even trace levels of contamination in DI Water or UPW systems can significantly impact production quality.

Critical contaminants include:

• TOC (Total Organic Carbon)
• Microorganisms
• Biofilm formation
• Ionic contamination
• Submicron particles

A small accumulation of organic compounds or microbial contamination inside a DI Water system can lead to:

• Increased product defect rates
• Filter clogging
• Reduced RO membrane lifespan
• Unplanned downtime
• Process instability

This is why many semiconductor manufacturers are realizing that:

Traditional UV systems or standalone ozone treatment are no longer sufficient for comprehensive contamination control in modern UPW systems.

Next-Generation AOP Technology from KITZ SCT

To address these challenges at the root cause level, KITZ SCT developed the PURECULASER system based on Advanced Oxidation Process (AOP) technology.

Unlike conventional disinfection technologies that focus only on killing microorganisms, PURECULASER is designed to control contaminants generated during the decomposition of organic materials and biofilm formation.

How PURECULASER AOP Technology Works

PURECULASER integrates multiple advanced oxidation technologies into a single AOP platform.

Accelerated Oxidation with Integrated Ozone

The system utilizes highly efficient oxidation and decomposition mechanisms through ozone integration.

This process generates Hydroxyl Radicals (OH•), one of the most powerful reactive oxygen species available for water treatment.

Hydroxyl radicals aggressively oxidize and break down:

• Organic contaminants
• Biofilm residues
• Dissolved impurities
• Difficult-to-remove compounds

UV Light Technology

Using UV light at a wavelength of 254 nm, the system:

• Destroys bacterial DNA structures
• Inactivates microorganisms
• Activates oxidation reactions
• Enhances organic decomposition efficiency

Photocatalyst Technology

Under UV irradiation, the photocatalyst surface generates additional Hydroxyl Radicals directly from water molecules.

This creates a continuous oxidation cycle capable of maintaining long-term microbial and organic contamination control within UPW systems.

Hydroxyl Radicals (OH•) – Molecular-Level Contamination Destruction

The integration of:

• Ozone
• UV technology
• Photocatalyst reactions

within the PURECULASER AOP system generates large quantities of Hydroxyl Radicals (OH•).

Hydroxyl radicals are considered the most powerful oxidizing agents among Reactive Oxygen Species (ROS).

Compared to traditional oxidants, OH radicals provide:

• Approximately 20 times stronger oxidation power than chlorine
• Approximately 5 times stronger oxidation power than standalone ozone systems

This enables the system to:

✔️ Decompose persistent organic contaminants

✔️ Continuously control microorganisms and biofilm

✔️ Improve UPW system stability

✔️ Reduce TOC levels effectively

✔️ Minimize contamination risks in semiconductor manufacturing

Key Advantages of Hydroxyl Radical Technology

Extremely High Oxidation Potential

Hydroxyl radicals provide an oxidation potential of: 2.81V making them among the most aggressive oxidizing agents available for ultra pure water applications.

Rapid Reaction Speed

OH radicals react almost instantly with contaminants, helping to:

• Prevent biofilm accumulation
• Reduce bacterial regrowth
• Stabilize water quality
• Maintain continuous UPW cleanliness

Minimal Chemical Residues

One major advantage of AOP technology is that Hydroxyl Radicals react rapidly and do not leave harmful chemical residues behind in the water system.

This is particularly important for:

• Semiconductor fabs
• Electronics manufacturing
• Pharmaceutical water systems
• Precision cleaning processes

where even trace residual chemicals can impact product quality.

Why AOP Is Becoming Essential for Modern Semiconductor UPW Systems

As semiconductor fabrication technologies continue advancing, water treatment challenges are no longer limited to simple filtration.

Modern UPW systems now require advanced control of:

• Organic contamination
• Microbial growth
• Biofilm formation
• TOC stability
• Submicron particle contamination

This is why Advanced Oxidation Process (AOP) technology is rapidly becoming the next-generation solution for semiconductor ultra pure water systems.

PURECULASER – Advanced UPW Contamination Control Solution

KITZ SCT PURECULASER provides semiconductor manufacturers with a highly advanced AOP solution designed to support:

• UPW system stability
• Continuous microbial control
• TOC reduction
• Biofilm prevention
• Semiconductor process reliability
• Long-term operational efficiency

As semiconductor fabs demand increasingly stringent contamination control standards, AOP technology is becoming a critical part of next-generation ultra pure water treatment strategies.