Astera™ Sub 10nm Liquid Filter

Product Introduction

The Astera™ Sub 10nm liquid filter by Entegris is a high-efficiency filtration solution designed to remove solid particles and impurities in semiconductor manufacturing and other industrial applications. Featuring an advanced polyarylsulfone (PAS) membrane and an optimized design, this filter delivers exceptional filtration performance and durability.

Technical Specifications

Key Features

• 10 nm PAS Membrane: Ensures high chemical purity and superior particle retention.

• Pleated Membrane Design: Increases effective filtration surface area, enhancing efficiency and extending filter life.

• DI Water Pre-wetted Packaging: Reduces degassing time and accelerates system startup.

• Chemical Compatibility: Suitable for processes involving dilute acids and bases.

Benefits

• Enhanced Production Performance: Minimizes downtime and boosts throughput.

• Reduced Operational Costs: Long service life and fewer replacements needed.

• Easy Integration: Flexible design fits various existing systems.

• Consistent Product Quality: Effectively removes impurities, ensuring high chemical purity.

Applications

Astera™ filters are widely used in:

• Semiconductor Industry: Filtration of dilute acids and bases used in chip and electronic component production.

• Flat Panel Display Industry: Filtration of process liquids in LCD and OLED display manufacturing.

• Chemical Industry: Filtration of liquids in the production of chemicals and electronic materials.

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Reference link: https://www.entegris.com/shop/en/USD/products/liquid-filtration-and-purification/liquid-filters/Trinzik-PEH-Aqueous-Process-Filter/p/TrinzikPEHAqueousProcessFilter?industry=