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Wafergard® II SF Micro XL In-line Gas Filter
Product Overview
The Wafergard® II SF Micro XL In-line Gas Filter from Entegris is a high-performance gas filtration solution designed for ultra-high-purity (UHP) gas applications. It features a stainless steel filter membrane enclosed in a fully metallic housing, making it ideal for use in high-temperature and high-pressure environments—particularly in semiconductor and advanced electronics manufacturing.
Technical Specifications
Product Code | Connection Size | Connection Type | Length (mm) | Max Operating Pressure | Max Operating Temperature | Particle Retention Efficiency |
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SI2R15E05 | 1/4″ | Gasket seal, male | 84.1 | 20 MPa (200 bar) @ 20°C | 460°C @ 35 bar | ≥99.9999999% |
SI2R19E07 | 1/4″ | Gasket seal, female | 50.8 | 20 MPa (200 bar) @ 20°C | 460°C @ 35 bar | ≥99.9999999% |
SI2R20E08 | 1/4″ | Gasket seal, male | 50.8 | 20 MPa (200 bar) @ 20°C | 460°C @ 35 bar | ≥99.9999999% |
WG2SS8RR2 | 1/4″ | Gasket seal, male | 84.1 | 20 MPa (200 bar) @ 20°C | 460°C @ 35 bar | ≥99.9999999% |
Note: Rated at ≥99.9999999% efficiency for particles ≥0.0015 µm.
Key Features
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Exceptional Filtration Efficiency: Captures ≥99.9999999% of particles ≥0.0015 µm to ensure ultra-pure gas output.
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Durable Construction: Stainless steel membrane within a full metal housing withstands extreme operating conditions.
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Compact Design: With lengths from 50.8 mm to 84.1 mm, these filters easily integrate into compact or existing systems.
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Ultra-Low Leak Rate: Meets helium leak standard of 2 × 10⁻¹⁰ atm-cc/sec, ensuring system integrity and reliability.
User Benefits
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Maximum Gas Purity: Minimizes contamination risks in precision manufacturing environments.
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Enhanced System Performance: Supports rapid startup and stable gas flow.
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Lower Maintenance Costs: Long-lasting and stable performance reduces replacement frequency.
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Broad Compatibility: Fits standard gas systems and supports a variety of gases.
Applications
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Semiconductor Manufacturing: Ultra-high-purity gas filtration for critical wafer and chip fabrication steps.
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Industrial Applications: Suitable for inert, reactive, and ozone gas systems.
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Compressed Gas Systems: Delivers clean, dry gas for sensitive equipment operations
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