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GateKeeper® GPU Gas Purifier
Product Overview
The GateKeeper® GPU is Entegris’ premium line of gas purifiers, engineered to remove impurities down to parts per trillion (ppt) levels. Designed for maximum purity in microelectronics processing, this purifier is compatible with a wide range of gases—including corrosive types like Cl₂, HBr, HCl, CF₄, SO₂, and SF₆—making it an ideal solution for high-purity applications.
Technical Specifications
Model | Max Flow Rate | Compatible Gases | Removed Impurities | Regenerable | Operating Temp. | Max Operating Pressure | Housing Material |
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GPU HX | 1000 slpm | H₂, D₂, N₂, Ar, He, Ne, Kr, Xe, H₂/N₂ | H₂O, O₂, CO, CO₂ < 100 ppt | Yes | 0–65°C | 1.2 MPa (12 bar) | 316L Stainless Steel |
GPU IX | 1000 slpm | N₂, Ar, He, Kr, Ne, Xe, CF₄, CH₄, C₂H₆, C₃H₈, C₄H₁₀ | H₂O, O₂, CO, CO₂, H₂ < 100 ppt; Sulfur Compounds < 1 ppb | Yes | 0–65°C | 1.2 MPa (12 bar) | 316L Stainless Steel |
GPU YX | 1000 slpm | NH₃, C₂H₄, GeH₄, CSiH₆, C₂H₇N, C₃H₆, SF₆, H₂/SiH₄ | H₂O, O₂, CO₂, Hydrocarbons >C₄, Metals < 1 ppb | Yes | 0–65°C | 1.2 MPa (12 bar) | 316L Stainless Steel |
GPU CX | 1000 slpm | HCl, Cl₂ | Organics, Metals, H₂O < 15 ppb | No | 0–65°C | 1.2 MPa (12 bar) | 316L Stainless Steel |
GPU CO | 1000 slpm | CO | H₂O, O₂, CO₂ < 1 ppb | No | 0–65°C | 1.2 MPa (12 bar) | 316L Stainless Steel |
Key Features
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Ultra-high Purity: Removes impurities down to ppt levels, ensuring the highest gas quality.
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Broad Gas Compatibility: Suitable for inert, corrosive, and specialty gases.
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Robust Design: Built with corrosion-resistant 316L stainless steel, rated for high temperature and pressure.
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No Power Required: Operates at ambient temperature without external energy input.
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Regenerable Options: Select models offer regeneration capability, reducing operational costs and environmental impact.
Benefits
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Enhanced Process Performance: Guarantees gas purity, minimizing contamination risk.
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Cost Efficiency: Long service life and regenerability lower maintenance and replacement expenses.
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Safe & Flexible Installation: Horizontal or vertical mounting options fit various equipment layouts.
Applications
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Semiconductor Manufacturing: Photolithography, epitaxy, dry etching, wafer growth, and deposition.
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Data Storage: Provides ultra-clean gas environments for storage device fabrication.
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Flat Panel Display & LED: Ensures high-purity gases for display and lighting production.
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Solar Energy: Supports clean gas processes in solar panel and photovoltaic cell manufacturing.
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