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Wafergard® MAX HT In-line Gas Filter
Product Introduction
The Wafergard® MAX HT In-line gas filter is a high-performance filtration solution developed by Entegris, designed specifically for ultra-high-purity gas applications at elevated temperatures, such as TEOS and high-k processes in CVD systems. With a compact design, heat resistance up to 200°C, and exceptional particle retention efficiency, this product is an ideal choice for modern gas delivery systems in the semiconductor and electronics industries.
Technical Specifications
| Product Code | Length | Filter Media | Housing Material | Particle Retention Size | Particle Retention Efficiency | Max Operating Pressure | Max Operating Temperature | Connection Type |
|---|---|---|---|---|---|---|---|---|
| WGMXMPRR4HT | 127 mm | PTFE | 316L Stainless Steel | ≥0.0015 µm | ≥99.9999999% @ 25°C | 0.99 MPa (143.15 psig) | 200°C (392°F) | 1/2″ VCR® |
| WGMXMPRR4HTL | 148 mm | PTFE | 316L Stainless Steel | ≥0.0015 µm | ≥99.9999999% @ 25°C | 0.99 MPa (143.15 psig) | 200°C (392°F) | 1/2″ VCR® |
Key Features
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Ultra-fine particle retention: Removes ≥99.9999999% of particles ≥0.0015 µm at 25°C, ensuring ultra-clean gas output.
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High-temperature resistance: Operates reliably at temperatures up to 200°C, ideal for TEOS and high-k processes.
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Compact design: Available in 127 mm or 148 mm lengths, easily integrates into existing systems.
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Quick startup: Special thermal treatment reduces system startup time.
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Low differential pressure: Helps maintain a stable gas flow and enhances material delivery efficiency.
Benefits
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Ensures gas purity: Minimizes the risk of contamination during production.
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Improves system efficiency: Reduces startup time and maintains a consistent gas flow.
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Cost-effective maintenance: Long service life and stable performance reduce the need for frequent replacements.
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High compatibility: Suitable for various gases and standard connection systems.
Applications
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Point-of-use filtration in CVD equipment: Ensures ultra-pure gases for chemical vapor deposition processes.
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High-temperature applications: Suitable for TEOS, high-k, and heated N₂ gas applications.
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Semiconductor and electronics industries: Meets strict cleanliness and stability requirements in microchip manufacturing.
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