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Wafergard® III NF-750 In-line GAS FILTER
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Wafergard® III NF-750 In-line Gas Filter
Product Introduction
The Wafergard® III NF-750 In-line gas filter is a high-performance, ultra-clean filtration solution specifically designed for gas systems that demand exceptional purity and durability. Featuring an all-metal construction and proprietary sintered nickel membrane, this product meets the most stringent requirements in the semiconductor, electronics, and chemical industries.
Technical Specifications
Specification | Wafergard® III NF-750 In-line |
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Part Number | WG3NS7RR4 |
Maximum Flow Rate | 750 slpm |
Connection Size | 1/2″ Gasket seal (VCR compatible) |
Filter Media | Proprietary sintered nickel membrane |
Housing Material | Electro-polished 316L stainless steel |
Post-Filter Particle Cleanliness | < 0.03 particles/liter (>0.01 µm) @ 300 slpm |
Particle Retention Efficiency | 99.9999999% @ 300 slpm; >99.9999% @ 750 slpm |
Maximum Inlet Pressure | 52 bar (750 psig) @ 100°C |
Maximum Operating Temperature | 400°C (752°F) with inert gases; 50°C (122°F) with corrosive gases |
Helium Leak Rate | Tested to 1×10⁻⁹ atm-cc/sec |
Warranty | 5 years |
Key Features
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Proprietary Nickel Membrane: Enables ultra-fine particle filtration ≥0.0015 µm with up to 9 LRV removal efficiency.
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All-Metal Construction: Enhances durability, heat resistance, and corrosion protection.
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Exceptional Cleanliness: Delivers gas purity with particle levels below 0.03 particles/liter, ideal for high-purity applications.
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High Heat and Pressure Tolerance: Operates reliably at temperatures up to 400°C and pressures up to 52 bar.
Benefits
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Ensures Gas Purity: Minimizes contamination risks in sensitive manufacturing processes.
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Extends Equipment Life: Protects downstream components from particles and impurities, increasing longevity.
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Reduces Maintenance Time: High durability and stable performance reduce the need for frequent replacements and maintenance.
Applications
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Ultra-High Purity Gas Systems: In semiconductor, flat panel display, LED, and solar manufacturing plants.
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High-Temperature Processes: Suitable for applications requiring elevated temperatures and pressures.
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Gas Distribution Systems: Used in valve manifold boxes and bulk gas distribution systems.
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Fluoropolymer Filter Replacement: Upgrade from existing fluoropolymer filters to achieve higher filtration performance.
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