Wafergard® II 3XP In-line Gas Filter

Product Overview

The Wafergard® II 3XP In-line Gas Filter is an ultra-high-purity (UHP) gas filter designed to meet the stringent demands of semiconductor and electronics manufacturing. With a flow capacity of up to 500 slpm, it is ideal for applications such as diffusion, annealing, and epitaxy, where maximum filtration efficiency and absolute reliability are critical.

Technical Specifications

Key Features

• Superior Filtration Performance: Effectively removes particles ≥0.0015 µm with extremely high retention efficiency.

• High-Quality Materials: Constructed entirely of 316L stainless steel, ensuring durability and excellent resistance to high temperature and pressure.

• Optimized Design: Standardized dimensions for seamless integration into existing gas systems without design modifications.

• Ultra-Clean Output: Achieves a cleanliness level of ≤0.03 particles/liter (>0.01 µm), ideal for ultra-pure gas applications.

• High Thermal & Pressure Resistance: Operates stably at temperatures up to 460°C and pressures up to 54 bar (780 psig).

• Low Leak Rate: Helium leak rate tested to 2 × 10⁻¹⁰ atm-cc/sec, ensuring system integrity and leak-tight performance.

User Benefits

• Protects Equipment: Minimizes the risk of particle-induced damage, extending the lifespan of downstream components.

• Improves Process Efficiency: Maintains gas purity, reduces wafer defects, and enhances overall yield.

• Cost-Effective: Reduces downtime and maintenance expenses thanks to its reliability and long service life.

• Easy Integration: Compact and modular design allows quick installation without major system changes.

Applications

• Semiconductor Industry: For ultra-high-purity gas filtration in wafer fabrication processes.

• Electronics Manufacturing: Ideal for gas systems demanding stable and clean gas supply.

• Industrial Gas Systems: Compatible with inert and reactive gases in high-temperature and high-pressure environments.

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