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COMPARE THE SUPERIORITY OF LEVITRONIX PUMP IN CHEMICAL MECHANICAL PLANARIZATION (CMP)
Tuesday April 16th, 2024
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COMPARE THE SUPERIORITY OF LEVITRONIX PUMP IN CHEMICAL MECHANICAL PLANARIZATION (CMP) Chemical Mechanical Planarization (CMP) must continuously improve to meet the stringent requirements of next generation IC device manufacturing. The consistency of the slurry is essential to achieve high process repeatability and uniformity. Compared to Levitronix® pumps, pneumatic pumps can cause shear stress due to check …