Wafergard® III NF Mini / Mini XL In-line GAS FILTER

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Wafergard® III NF Mini / Mini XL In-line Gas Filter


Product Overview

The Wafergard® III NF Mini and Mini XL In-line gas filters provide ultra-clean, high-performance filtration tailored for critical gas systems requiring superior purity and durability. Designed with an all-metal body and proprietary sintered nickel membrane, these filters are ideal for demanding applications in semiconductor manufacturing, electronics, and chemical processing industries.

Technical Specifications

Specification Wafergard® III NF Mini In-line Wafergard® III NF Mini XL In-line
Part Numbers WG3NS1RR2 WG3NS2RR2 / WG3NS2RR4
Maximum Flow Rate 60 slpm 120 slpm
Connection Size 1/4″ or 1/2″ Gasket seal (VCR compatible) 1/4″ or 1/2″ Gasket seal (VCR compatible)
Length 84.1 mm (3.31″) 127.0 mm (5.00″) / 133.3 mm (5.25″)
Filter Media Proprietary sintered nickel membrane Proprietary sintered nickel membrane
Housing Material Electro-polished 316L stainless steel Electro-polished 316L stainless steel
Post-Filter Particle Cleanliness < 0.03 particles/liter (>0.01 µm) < 0.03 particles/liter (>0.01 µm)
Particle Retention Efficiency 99.9999999% (9 LRV) @ 60 slpm 99.9999999% (9 LRV) @ 120 slpm
Maximum Inlet Pressure 16.2 MPa (162 bar) @ 20°C 16.2 MPa (162 bar) @ 20°C
Maximum Operating Temperature 400°C (inert gases); 50°C (corrosive gases) 400°C (inert gases); 50°C (corrosive gases)
Helium Leak Rate Tested to 1×10⁻⁹ atm-cc/sec Tested to 1×10⁻⁹ atm-cc/sec
Warranty 5 years 5 years

Key Features

  • Proprietary Nickel Membrane: Filters particles as small as ≥0.0015 µm with a retention efficiency of 9 LRV.

  • All-Metal Construction: Offers exceptional durability, heat resistance, and corrosion protection.

  • Superior Cleanliness: Ensures post-filter gas cleanliness of <0.03 particles/liter, ideal for ultra-pure processes.

  • High Pressure & Temperature Endurance: Operates reliably at pressures up to 162 bar and temperatures up to 400°C.

Benefits

  • Maintains Gas Purity: Minimizes contamination in sensitive manufacturing processes.

  • Protects Downstream Equipment: Prevents particle-induced wear, extending equipment life.

  • Reduces Maintenance: High durability and performance consistency lead to fewer replacements and maintenance interventions.

Applications

  • Ultra-Clean Gas Systems: Used in semiconductor, flat panel display, LED, and solar production facilities.

  • High-Temperature Environments: Ideal for processes requiring elevated heat and pressure.

  • Gas Distribution Systems: Suitable for valve-manifold boxes and high-volume gas delivery systems.

  • Fluoropolymer Filter Replacement: An upgrade from existing fluoropolymer filters for improved performance.

 

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Reference link: https://www.entegris.com/shop/en/USD/products/gas-filtration-and-purification/gas-filters/in-line-nickel-gas-filters/Wafergard-III-NF-Mini-Mini-XL-In-line-Gas-Filters/p/WafergardIIINFMiniXLInlineGasFilters

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