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Protego® AT 2 nm PURIFIER
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Protego® AT 2 nm Purifier
Product Introduction
The Protego® AT 2 nm Purifier by Entegris is an advanced solvent filtration solution specifically designed to efficiently remove particles and metal ions in IPA (Isopropyl Alcohol) cleaning applications. Featuring a 2 nm PTFE membrane and a dedicated ion exchange (IEX) layer, this purifier delivers exceptional filtration performance and durability, meeting the rigorous standards of modern semiconductor manufacturing processes.
Specifications
Product Code | Membrane Type | Particle Retention | Housing Material | Inlet/Outlet Size (inch) | Max Operating Temp. | Max Operating Pressure |
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P1500 | PTFE | 2 nm | PFA | 3/8″ I/O – 1/4″ V/D | 70°C (158°F) | 0.59 MPa @ 25°C |
P3000 | PTFE | 2 nm | PFA | 3/8″ I/O – 1/4″ V/D | 70°C (158°F) | 0.59 MPa @ 25°C |
Chem-Line™ II ATE 10” | PTFE | 2 nm | PFA | 1/2″ I/O – 1/4″ V/D | 80°C (176°F) | 0.59 MPa @ 25°C |
Key Features
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2 nm PTFE membrane: Provides ultra-fine filtration of particles and metal ions down to 2 nm.
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Dedicated ion exchange (IEX) layer: Enhances metal ion removal and supports long-term stable filtration.
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Integrated design: Combines filtration and purification in a single unit for space-efficient installation.
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High-quality fluoropolymer construction: Offers superior durability and thermal resistance.
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UCM5P cleaning method: Enables fast system startup after installation.
Benefits
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Improved production efficiency: Minimizes downtime and increases throughput.
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Ensured product quality: Effectively removes contaminants to maintain solvent purity.
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Lower operational costs: Long filter lifespan reduces replacement frequency.
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Easy integration: Flexible design fits a wide range of existing systems.
Applications
The Protego® AT 2 nm Purifier is widely used in:
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Semiconductor industry: For solvent filtration in chip and electronic component manufacturing, especially in sub-7 nm technologies.
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IPA cleaning processes: Ensures high purity of IPA in critical cleaning operations.
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Point-of-use (POU) applications: Installed close to the usage point for optimal filtration efficiency.
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