{"id":2814,"date":"2026-02-11T11:40:14","date_gmt":"2026-02-11T04:40:14","guid":{"rendered":"https:\/\/filterfinevn.com\/?p=2814"},"modified":"2026-02-11T11:47:43","modified_gmt":"2026-02-11T04:47:43","slug":"hot-topic-entegris-tai-spie-2026-giai-phap-euv-filtration-pod-filterfine","status":"publish","type":"post","link":"https:\/\/filterfinevn.com\/en\/hot-topic-entegris-tai-spie-2026-giai-phap-euv-filtration-pod-filterfine\/","title":{"rendered":"Entegris SPIE 2026 \u2013 Filtration, Purification &#038; EUV Pod Solutions"},"content":{"rendered":"<p><img loading=\"lazy\" decoding=\"async\" class=\"aligncenter size-full wp-image-2815\" src=\"https:\/\/filterfinevn.com\/wp-content\/uploads\/2026\/02\/628154429_1502766671851438_4267245664475915391_n.jpg\" alt=\"\" width=\"1200\" height=\"630\" srcset=\"https:\/\/filterfinevn.com\/wp-content\/uploads\/2026\/02\/628154429_1502766671851438_4267245664475915391_n.jpg 1200w, https:\/\/filterfinevn.com\/wp-content\/uploads\/2026\/02\/628154429_1502766671851438_4267245664475915391_n-1024x538.jpg 1024w, https:\/\/filterfinevn.com\/wp-content\/uploads\/2026\/02\/628154429_1502766671851438_4267245664475915391_n-768x403.jpg 768w, https:\/\/filterfinevn.com\/wp-content\/uploads\/2026\/02\/628154429_1502766671851438_4267245664475915391_n-510x268.jpg 510w\" sizes=\"auto, (max-width: 706px) 89vw, (max-width: 767px) 82vw, 740px\" \/><\/p>\n<h3 data-start=\"402\" data-end=\"477\">Discover Next-Generation EUV Filtration, Purification, and Pod Solutions<\/h3>\n<p data-start=\"479\" data-end=\"632\">Filterfine Vietnam is pleased to share updates from <strong data-start=\"531\" data-end=\"543\">Entegris<\/strong>, our strategic technology partner, at <strong data-start=\"582\" data-end=\"631\">SPIE Advanced Lithography and Patterning 2026<\/strong>.<\/p>\n<p data-start=\"634\" data-end=\"719\">At this global semiconductor event, Entegris will showcase its latest innovations in:<\/p>\n<p data-start=\"721\" data-end=\"960\">\u2705 <strong data-start=\"723\" data-end=\"737\">Filtration<\/strong> \u2013 Ultra-high purity filtration for advanced semiconductor processes<br data-start=\"805\" data-end=\"808\" \/>\u2705 <strong data-start=\"810\" data-end=\"826\">Purification<\/strong> \u2013 Chemical purification technologies for defect reduction<br data-start=\"884\" data-end=\"887\" \/>\u2705 <strong data-start=\"889\" data-end=\"903\">Pod Design<\/strong> \u2013 Advanced EUV pod solutions for contamination control<\/p>\n<p data-start=\"962\" data-end=\"1094\">These solutions directly address <strong data-start=\"995\" data-end=\"1020\">defectivity reduction<\/strong>, <strong data-start=\"1022\" data-end=\"1043\">yield improvement<\/strong>, and enable <strong data-start=\"1056\" data-end=\"1093\">next-generation EUV manufacturing<\/strong>.<\/p>\n<h3 data-start=\"1101\" data-end=\"1125\">\ud83d\udccd Conference Session<\/h3>\n<p data-start=\"1127\" data-end=\"1181\">\ud83d\uddd3 February 25 | \u23f0 10:30 AM<br data-start=\"1154\" data-end=\"1157\" \/>\ud83d\udccc Grand Ballroom 220A<\/p>\n<h3 data-start=\"1183\" data-end=\"1270\">Particle Quantification on EUV Inner Pods Using Adhesive and Light-Scattering Tools<\/h3>\n<p data-start=\"1272\" data-end=\"1484\">This session focuses on quantifying particles inside EUV pods using adhesive sampling and light-scattering technologies\u2014providing accurate insight into particle generation sources within ultra-clean environments.<\/p>\n<h3 data-start=\"1491\" data-end=\"1512\">\ud83d\udccd Poster Sessions<\/h3>\n<p data-start=\"1514\" data-end=\"1584\">\ud83d\uddd3 February 25 | \u23f0 5:30 PM \u2013 7:00 PM<br data-start=\"1550\" data-end=\"1553\" \/>\ud83d\udccc Convention Center \u2013 Hall B<\/p>\n<p data-start=\"1586\" data-end=\"1655\">Entegris will present multiple application-driven studies, including:<\/p>\n<h3 data-start=\"1657\" data-end=\"1714\">\ud83d\udd39 A Novel Purifier for Acid-Sensitive Applications<\/h3>\n<p data-start=\"1715\" data-end=\"1806\">Suppressing solvent dimerization and trace metal contamination in acid-sensitive processes.<\/p>\n<h3 data-start=\"1808\" data-end=\"1858\">\ud83d\udd39 Photoresist Filtration Design Advancement<\/h3>\n<p data-start=\"1859\" data-end=\"1954\">Next-generation UPE filtration technology to improve throughput and reduce photoresist defects.<\/p>\n<h3 data-start=\"1956\" data-end=\"2030\">\ud83d\udd39 Ultra-Clean Nylon Filtration for EUV Underlayer Defect Mitigation<\/h3>\n<p data-start=\"2031\" data-end=\"2106\">Supporting N2 node performance and yield with ultra-clean nylon filtration.<\/p>\n<h3 data-start=\"2108\" data-end=\"2170\">\ud83d\udd39 Point-of-Use Membrane Filter Optimization for EUV CAR<\/h3>\n<p data-start=\"2171\" data-end=\"2268\">Reducing bridging defects in chemically amplified resist (CAR) processes for high-NA lithography.<\/p>\n<h3 data-start=\"2270\" data-end=\"2314\">\ud83d\udd39 EUV Dual Pod EIP Polymer Separation<\/h3>\n<p data-start=\"2315\" data-end=\"2437\">Introducing the NX Pod with polymer pads to eliminate metal-to-metal contact and significantly reduce particle generation.<\/p>\n<h3 data-start=\"2444\" data-end=\"2513\">Core Value Entegris Brings to Advanced Semiconductor Manufacturing<\/h3>\n<p data-start=\"2515\" data-end=\"2686\">\u2714 Reduced particle generation<br data-start=\"2544\" data-end=\"2547\" \/>\u2714 Improved trace metal control<br data-start=\"2577\" data-end=\"2580\" \/>\u2714 Lower defect density<br data-start=\"2602\" data-end=\"2605\" \/>\u2714 Increased EUV production yield<br data-start=\"2637\" data-end=\"2640\" \/>\u2714 Support for advanced nodes (N2, High-NA EUV)<\/p>\n<h3 data-start=\"2693\" data-end=\"2759\">\ud83d\udd17 Register for SPIE Advanced Lithography and Patterning 2026<\/h3>\n<p data-start=\"2760\" data-end=\"2794\">\ud83d\udc49 <a class=\"decorated-link\" href=\"https:\/\/entegris.info\/3NMIAbU\" target=\"_new\" rel=\"noopener\" data-start=\"2763\" data-end=\"2792\">https:\/\/entegris.info\/3NMIAbU<\/a><\/p>\n<h3 data-start=\"2801\" data-end=\"2866\">Filterfine Vietnam \u2013 Authorized Entegris Distributor in Vietnam<\/h3>\n<p data-start=\"2868\" data-end=\"2963\">Filterfine Vietnam provides comprehensive Entegris solutions for semiconductor fabs, including:<\/p>\n<p data-start=\"2965\" data-end=\"3174\">\u2705 Filtration &amp; purification for chemicals, photoresist, and slurry<br data-start=\"3031\" data-end=\"3034\" \/>\u2705 EUV pod and contamination control solutions<br data-start=\"3079\" data-end=\"3082\" \/>\u2705 EUV application consulting<br data-start=\"3110\" data-end=\"3113\" \/>\u2705 Technical support, validation, and on-site implementation<\/p>\n<p data-start=\"3176\" data-end=\"3302\">\ud83d\udce9 Contact Filterfine Vietnam to receive detailed technical documentation or discuss tailored Entegris solutions for your fab.<\/p>\n<p><\/p>","protected":false},"excerpt":{"rendered":"<p class=\"qtranxs-available-languages-message qtranxs-available-languages-message-en\">Sorry, this entry is only available in <a href=\"https:\/\/filterfinevn.com\/vi\/wp-json\/wp\/v2\/posts\/2814\" class=\"qtranxs-available-language-link qtranxs-available-language-link-vi\" title=\"Ti\u1ebfng Vi\u1ec7t\">Ti\u1ebfng Vi\u1ec7t<\/a>.<\/p>\n","protected":false},"author":1,"featured_media":2815,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[1,181],"tags":[194,429,411,617,430,221,275],"class_list":["post-2814","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-tin-tuc","category-tin-tuc-cong-nghe","tag-entegris","tag-filterfine","tag-filterfine-viet-nam","tag-filtration","tag-fvn","tag-phong-sach","tag-thiet-bi-lay-mau-vi-sinh-khong-khi-chu-dong"],"yoast_head":"<!-- This site is optimized with the 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